The formation of an photosensitive device due to the local breakdown in an MOS structure with an impurity containing oxide layer has been monitored. A stepwise breakdown of the oxide layer resulted in the formation of a diode like characteristics with further on stable current-voltage characteristics. Under illumination with white and blue light we found a high photosensitivity of the resulting structure, probably due to the formation of a local p-n junction due to out-diffusion from the oxide of n-type dopants into the underlying silicon substrate. Using a blue light LED illumination during the monitoring of the device formation enables the identification of the moment, when a high ratio between photo- and dark current is obtained.

Monitoring of the formation of a photosensitive device by electric breakdown of an impurity containing oxide in a MOS capacitor

Giovanni LANDI;NEITZERT, Heinrich Christoph
2012-01-01

Abstract

The formation of an photosensitive device due to the local breakdown in an MOS structure with an impurity containing oxide layer has been monitored. A stepwise breakdown of the oxide layer resulted in the formation of a diode like characteristics with further on stable current-voltage characteristics. Under illumination with white and blue light we found a high photosensitivity of the resulting structure, probably due to the formation of a local p-n junction due to out-diffusion from the oxide of n-type dopants into the underlying silicon substrate. Using a blue light LED illumination during the monitoring of the device formation enables the identification of the moment, when a high ratio between photo- and dark current is obtained.
2012
9780819488923
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11386/3123671
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