The admittance of metal oxide semiconductor (MOS) diode after switching from inversion to deep depletion is calculated. Special attention is given to the final stationary state in inversion conditions. For this state the relaxation equations must be modified because the usually assumed large signal carrier deficits are not valid. The results of these dispersion measurements are compared with the conventional Zerbst technique. Good agreement is obtained. The dispersion technique is a valuable tool for determining very short lifetimes.

Comparison of lifetime measurements from the Zerbst and the dispersion techniques

NEITZERT, Heinrich Christoph
1993

Abstract

The admittance of metal oxide semiconductor (MOS) diode after switching from inversion to deep depletion is calculated. Special attention is given to the final stationary state in inversion conditions. For this state the relaxation equations must be modified because the usually assumed large signal carrier deficits are not valid. The results of these dispersion measurements are compared with the conventional Zerbst technique. Good agreement is obtained. The dispersion technique is a valuable tool for determining very short lifetimes.
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11386/3140430
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 5
  • ???jsp.display-item.citation.isi??? 2
social impact