The electrical resistivity of magnetron-sputtered polycrystalline NbN thin films has been measured as a function of the temperature for a variety of samples exhibiting different grain structures. The data are very well described by a model recently proposed by Reiss, Vancea, and Hoffman for granular metallic systems. The model correctly predicts the observed negative temperature coefficient of resistivity and the occurrence of a minimum in the temperature dependence of the resistivity. © 1988 The American Physical Society.

Electrical resistivity of polycrystalline niobium nitride films

NIGRO, Angela;RUBINO, MARIA GRAZIA;VAGLIO, Ruggero
1988-01-01

Abstract

The electrical resistivity of magnetron-sputtered polycrystalline NbN thin films has been measured as a function of the temperature for a variety of samples exhibiting different grain structures. The data are very well described by a model recently proposed by Reiss, Vancea, and Hoffman for granular metallic systems. The model correctly predicts the observed negative temperature coefficient of resistivity and the occurrence of a minimum in the temperature dependence of the resistivity. © 1988 The American Physical Society.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11386/4697047
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