In this work we discuss the result of the fabrication with photolithography process of microstrips made of MoSi/Al superconducting films, with different widths and patterns suitable for single photon detection. The different designs presented are adopted to increase the sensitive area.

Superconducting Microbridges for large area single photon detectors

Carmine Attanasio;
2022-01-01

Abstract

In this work we discuss the result of the fabrication with photolithography process of microstrips made of MoSi/Al superconducting films, with different widths and patterns suitable for single photon detection. The different designs presented are adopted to increase the sensitive area.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11386/4825855
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