Herein, we present the results obtained with a field effect transistor fabricated using a thin gallium selenide (GaSe) flake as the channel. The fabricated device exhibits n-type conduction behaviour and shows a photo response under illumination by a laser. Notably, the device exhibits memory behaviour maintaining stability for more than 4 hours with repeatable cycles and sensitivity to light stimuli. This confirms its potential as a non-volatile optoelectronic memory, offering an enhanced programming window under laser illumination. The results provide a fundamental understanding of n-type conduction of GaSe thin flake and demonstrate that the investigated material could be suitable for future optoelectronic devices.

n-type GaSe thin flake for optoelectronic devices

A. Kumar
Writing – Original Draft Preparation
;
A. Pelella
Formal Analysis
;
K. Intonti
Investigation
;
L. Viscardi
Investigation
;
O. Durante
Investigation
;
F. Giubileo
Validation
;
L. Camilli
Validation
;
A. Di Bartolomeo
Writing – Review & Editing
2025

Abstract

Herein, we present the results obtained with a field effect transistor fabricated using a thin gallium selenide (GaSe) flake as the channel. The fabricated device exhibits n-type conduction behaviour and shows a photo response under illumination by a laser. Notably, the device exhibits memory behaviour maintaining stability for more than 4 hours with repeatable cycles and sensitivity to light stimuli. This confirms its potential as a non-volatile optoelectronic memory, offering an enhanced programming window under laser illumination. The results provide a fundamental understanding of n-type conduction of GaSe thin flake and demonstrate that the investigated material could be suitable for future optoelectronic devices.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11386/4915115
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