We apply molecular beam epitaxy to grow GeSn-nanoparticles on top of Si-nanopillars patterned onto p-type Si wafers. We use x-ray photoelectron spectroscopy to confirm a metallic behavior of the nanoparticle surface due to partial Sn segregation as well as the presence of a superficial Ge oxide. We report the observation of stable field emission (FE) current from the GeSn-nanoparticles, with turn on field of ##IMG## [http://ej.iop.org/images/0957-4484/27/48/485707/nanoaa44f8ieqn1.gif] $65\,\,\rmV\,\mu \rmm^-\rm1$ and field enhancement factor β ∼ 100 at anode–cathode distance of ∼0.6 μ m. We prove that FE can be enhanced by preventing GeSn nanoparticles oxidation or by breaking the oxide layer through electrical stress. Finally, we show that GeSn/p–Si junctions have a rectifying behavior.
Observation of field emission from GeSn nanoparticles epitaxially grown on silicon nanopillar arrays
DI BARTOLOMEO, Antonio;
2016
Abstract
We apply molecular beam epitaxy to grow GeSn-nanoparticles on top of Si-nanopillars patterned onto p-type Si wafers. We use x-ray photoelectron spectroscopy to confirm a metallic behavior of the nanoparticle surface due to partial Sn segregation as well as the presence of a superficial Ge oxide. We report the observation of stable field emission (FE) current from the GeSn-nanoparticles, with turn on field of ##IMG## [http://ej.iop.org/images/0957-4484/27/48/485707/nanoaa44f8ieqn1.gif] $65\,\,\rmV\,\mu \rmm^-\rm1$ and field enhancement factor β ∼ 100 at anode–cathode distance of ∼0.6 μ m. We prove that FE can be enhanced by preventing GeSn nanoparticles oxidation or by breaking the oxide layer through electrical stress. Finally, we show that GeSn/p–Si junctions have a rectifying behavior.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
